au.\*:("YESS, K")
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A spin-on photosensitive polymeric etch protection mask for anisotropic wet etching of siliconDALVI-MALHOTRA, J; ZHONG, X. F; PLANJE, C et al.Journal of micromechanics and microengineering (Print). 2008, Vol 18, Num 2, issn 0960-1317, 025029.1-025029.8Article
